JACoW is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.
@inproceedings{savard:ipac2022-wepost053,
author = {N. Savard and M.P. Dehnel and J.J. Munich},
title = {{Extraction of High-Charge State Argon and α-Particles from D-Pace Penning Ion Source Test Stand}},
booktitle = {Proc. IPAC'22},
% booktitle = {Proc. 13th International Particle Accelerator Conference (IPAC'22)},
pages = {1816--1818},
eid = {WEPOST053},
language = {english},
keywords = {ion-source, operation, extraction, cathode, experiment},
venue = {Bangkok, Thailand},
series = {International Particle Accelerator Conference},
number = {13},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {07},
year = {2022},
issn = {2673-5490},
isbn = {978-3-95450-227-1},
doi = {10.18429/JACoW-IPAC2022-WEPOST053},
url = {https://jacow.org/ipac2022/papers/wepost053.pdf},
abstract = {{At D-Pace’s Ion Source Test Facility (ISTF), we measure the extracted current of high-charge state ions from a hot cathode Penning ion source. Producing high-charge states of Boron, Arsenic, and Phosphorous is of interest to the ion implantation community. Higher-charge states allow these doping agents to be accelerated to higher energies within the same accelerating electric fields. When used for doping silicon semiconductors, this allows for deeper implantation of the ions. We use Argon and Helium gas as a proxy to determine whether the Penning ion source could be used for this application as it is less toxic to work with. The ability to reach charge states of greater than 4+ with Argon and 1+ with Helium leads to the possibility of producing highe-charge states of ions used in the ion implantation industry. This paper shows the extracted beam currents of Ar³⁺ - Ar⁶⁺ and alpha-ions for the hot cathode Penning ion source with variations in the confining magnetic field (0.4 - 0.95 T), gas flow (0.3 - 10 sccm), and arc discharge current (1 - 3 A).}},
}